Oxford Instruments plc (LON:OXIG – Get Free Report) insider Gavin Hill acquired 7 shares of the stock in a transaction on Thursday, October 10th. The shares were bought at an average price of GBX 1,996 ($26.06) per share, for a total transaction of £139.72 ($182.45).
Gavin Hill also recently made the following trade(s):
- On Tuesday, September 10th, Gavin Hill purchased 7 shares of Oxford Instruments stock. The stock was acquired at an average price of GBX 2,184 ($28.52) per share, for a total transaction of £152.88 ($199.63).
- On Monday, August 12th, Gavin Hill bought 7 shares of Oxford Instruments stock. The shares were bought at an average cost of GBX 2,413 ($31.51) per share, for a total transaction of £168.91 ($220.57).
- On Wednesday, August 7th, Gavin Hill sold 25,000 shares of Oxford Instruments stock. The shares were sold at an average price of GBX 2,274 ($29.69), for a total value of £568,500 ($742,360.93).
Oxford Instruments Stock Performance
OXIG stock opened at GBX 1,938 ($25.31) on Wednesday. The firm has a market cap of £1.12 billion, a PE ratio of 2,227.59, a P/E/G ratio of -3.56 and a beta of 0.96. The company has a quick ratio of 1.11, a current ratio of 1.64 and a debt-to-equity ratio of 12.96. The business has a 50 day moving average of GBX 2,168.57 and a 200-day moving average of GBX 2,306.26. Oxford Instruments plc has a 12-month low of GBX 1,634 ($21.34) and a 12-month high of GBX 2,765 ($36.11).
Analyst Upgrades and Downgrades
Check Out Our Latest Stock Report on OXIG
Oxford Instruments Company Profile
Oxford Instruments plc provide scientific technology products and services for academic and commercial organizations worldwide. It operates through three segments: Materials & Characterisation, Research & Discovery, and Service & Healthcare. The company offers atomic force, electron, and Raman microscopy; deposition tools comprising plasma enhanced chemical vapour deposition, chemical vapour deposition, inductively coupled plasma chemical vapour deposition, atomic layer deposition, and ion beam deposition systems; and etch tools, including inductively coupled plasma etching, reactive ion etching, deep silicon etching, atomic layer etching, and ion beam etching systems.
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