Berenberg Bank Cuts Oxford Instruments (LON:OXIG) Price Target to GBX 2,830

Oxford Instruments (LON:OXIG) had its price target trimmed by Berenberg Bank from GBX 2,925 ($37.64) to GBX 2,830 ($36.42) in a report released on Tuesday, Marketbeat.com reports. The brokerage currently has a buy rating on the stock.

Separately, Shore Capital restated a “buy” rating on shares of Oxford Instruments in a research note on Wednesday, October 16th.

Oxford Instruments Trading Up 1.2 %

Shares of LON OXIG opened at GBX 2,110 ($27.15) on Tuesday. The business has a fifty day moving average price of GBX 2,094.33 and a 200 day moving average price of GBX 2,306.46. Oxford Instruments has a 1-year low of GBX 1,932 ($24.86) and a 1-year high of GBX 2,765 ($35.58). The company has a debt-to-equity ratio of 12.96, a current ratio of 1.64 and a quick ratio of 1.11. The stock has a market capitalization of £1.22 billion, a P/E ratio of 2,453.49, a price-to-earnings-growth ratio of -3.56 and a beta of 0.96.

Oxford Instruments Cuts Dividend

The firm also recently announced a dividend, which will be paid on Friday, January 10th. Stockholders of record on Thursday, November 28th will be given a dividend of GBX 5.10 ($0.07) per share. This represents a dividend yield of 0.24%. The ex-dividend date is Thursday, November 28th. Oxford Instruments’s dividend payout ratio (DPR) is presently 2,441.86%.

About Oxford Instruments

Oxford Instruments plc provide scientific technology products and services for academic and commercial organizations worldwide. It operates through three segments: Materials & Characterisation, Research & Discovery, and Service & Healthcare. The company offers atomic force, electron, and Raman microscopy; deposition tools comprising plasma enhanced chemical vapour deposition, chemical vapour deposition, inductively coupled plasma chemical vapour deposition, atomic layer deposition, and ion beam deposition systems; and etch tools, including inductively coupled plasma etching, reactive ion etching, deep silicon etching, atomic layer etching, and ion beam etching systems.